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论文共 243 篇作者统计合作学者相似作者

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Resolution Enhancement for High-Numerical Aperture Extreme Ultraviolet Lithography by Split Pupil Exposures: a Modeling Perspective
Andreas Erdmann, Hazem Mesilhy,Peter Evanschitzky, Gerardo Bottiglieri, Tim Brunner,Eelco van Setten, M.-Claire van Lare, Mark van de Kerkhof
Journal of Micro/Nanopatterning, Materials, and Metrologyno. 01 (2024)
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Modelling and Compensating Proximity Effects in Massively Parallelized Multiphoton Photoplotting
F. Ogor, T. Le Deun, V. Sedova, J. Rovera,A. Erdmann, M. Flury,K. Heggarty
3D PRINTED OPTICS AND ADDITIVE PHOTONIC MANUFACTURING IV (2024)
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Advances in Modeling and Optimization for Two-Photon Lithography
Valeriia Sedova,Florie Ogor, Joel Rovera,Odysseus Tsilipakos, Lisa Lemberg,Kevin Heggarty,Andreas Erdmann
COMPUTATIONAL OPTICS 2024 (2024)
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Modeling of Multi-Trigger Resists
Thiago José dos Santos,Zelalem Belete,Andreas Erdmann,Alex Robinson,Carmen Popescu,Alexandra McClelland
39th European Mask and Lithography Conference (EMLC 2024) (2024)
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Imaging Effects of Particles on the Surface of EUV Mask and Wafer
Rawan Semaan,Gerardo Bottiglieri,Andreas Erdmann,Gijsbert Rispens,Laurens de Winter, Steven Beekmans
39th European Mask and Lithography Conference (EMLC 2024) (2024)
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3D Mask Defect and Repair Simulation Based on SEM Images
Vlad Medvedev,Peter Evanschitzky,Andreas Erdmann
37TH EUROPEAN MASK AND LITHOGRAPHY CONFERENCE (2022)
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作者统计

#Papers: 247

#Citation: 2259

H-Index: 24

G-Index: 34

Sociability: 6

Diversity: 0

Activity: 1

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