He is expert in thin films and plasma technology and in different aspects of surface science and catalysis, with high experience in different methods of characterization including synchrotron radiation techniques. His current scientific interest encompasses different problems related with the growth and application of porous thin films prepared by vacuum and plasma techniques and other functional plasma coatings and supported nanostructures with applications as sensors, optical devices, wetting control, microfluidics, fuel cells and other energy related problems. Plasma catalysis constitutes at present another topic of interest.