基本信息
浏览量:26
职业迁徙
个人简介
Cyrus Tabery was born in Austin, TX, USA. He is currently pursuing the graduation degree in chemical engineering with the University of Texas at Austin, Austin, where he studied lithography with the Willson Research Group.
In 2000, he was with AMD, Silicon Valley, CA, USA, where he researched on lithography, mask making, and OPC. He worked with Globalfoundries, Santa Clara, CA, USA, until August 2011 and Intel Custom Foundry from 2011 to 2016 on process design kit development with focus on physical verification and fill and DFM technology. In 2016, he joined ASML, Veldhoven, The Netherlands, to work on design and patterning technology in Brion ATD. He is an Expert in yield, DFT, statistics, design technology, lithography, metrology, reticle technology, and OPC.
研究兴趣
论文共 122 篇作者统计合作学者相似作者
按年份排序按引用量排序主题筛选期刊级别筛选合作者筛选合作机构筛选
时间
引用量
主题
期刊级别
合作者
合作机构
Cyrus E. Tabery, Jiuning Hu,Rongkuo Zhao,Christoph Hennerkes,Stephen Hsu, Yunbo Liu,Natalia Davydova, Victor M. Blanco,Vincent J. Wiaux
Optical and EUV Nanolithography XXXVII (2024)
Jyun-Ming Chen,David Rio,Maxence Delorme,Cyrus Tabery,Christoph Hennerkes,Chris Spence,Benjamin Kam, Mohand Brouri,Nader Shamma
OPTICAL AND EUV NANOLITHOGRAPHY XXXVII (2024)
V. M. Blanco Carballo, E. Canga, C. Jehoul, A. Moussa,A. H. Tamaddon,C. Tabery, G. Gunjala, B. Menchtchikov, V. G. Zacca, S. Lalbahadoersing, A. den Boef, R. Synowicky
METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVII (2023)
Moosong Lee,Jinsun Kim, Dohyeon Park,Yeeun Han, Junseong Yoon,Seung Yoon Lee,Chan Hwang,Achim Woessner,Cyrus E. Tabery, Miao Wang,Antonio Corradi,Young-Hoon Song,Yun-A Sung,Thomas Kim,Aileen Soco,Jason Kim, Max Hsieh
Metrology, Inspection, and Process Control XXXVI (2022)
Moosong Lee,Jinsun Kim, Dohyeon Park,Yeeun Han, Junseong Yoon,Seung Yoon Lee,Chan Hwang,Achim Woessner,Cyrus E. Tabery, Miao Wang,Antonio Corradi,Young-Hoon Song,Yun-A Sung,Thomas Kim,Aileen Soco,Jason Kim,Chih-Hung Hsieh
G. Schelcher,E. P. De Poortere, N. Kissoon,S. Paolillo,Marsil de A. Costa E. Silva, Y. Zhang,C. Tabery,J. Mulkens, M. McManus,P. Leray, S. Halder
EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY XII (2021)
Advanced Etch Technology for Nanopatterning IX (2020)
加载更多
作者统计
#Papers: 122
#Citation: 3834
H-Index: 31
G-Index: 55
Sociability: 6
Diversity: 0
Activity: 0
合作学者
合作机构
D-Core
- 合作者
- 学生
- 导师
数据免责声明
页面数据均来自互联网公开来源、合作出版商和通过AI技术自动分析结果,我们不对页面数据的有效性、准确性、正确性、可靠性、完整性和及时性做出任何承诺和保证。若有疑问,可以通过电子邮件方式联系我们:report@aminer.cn