Eiji Morifuji

Eiji Morifuji (M'98–A'01–M'03) was born in Kyoto, Japan. He received the B.S. and M.S. degrees in electrical engineering from the University of Tokyo, Tokyo, Japan, in 1993 and 1995, respectively. In 1995, he joined the Research and Development Center, Toshiba Corporation, Kawasaki, Japan, where he was engaged in the research of advanced CMOS and RF devices and then moved to the Semiconductor Company, where he has been working on the research and development of CMOS system LSI with the System LSI Division. From 2005 to 2006, he spent one year with Stanford University, where he worked on the scaling and low-power optimization of CMOS. Mr. Morifuji is a member of the IEEE Electron Devices Society.