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排名必读论文期刊顶会热点AI 简史溯源树小脉星探人才迁徙塔尖人才国防情报追踪开源工具智慧手语
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论文共 33 篇作者统计合作学者相似作者

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Investigation into the effect of a PECVD-deposited SiOx chamber coating on the selective, radical-based NF3 etching of TaN with respect to BEOL low-k
I. V. Otto,C. Vallee,S. Kal, P. Biolsi
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY Bno. 3 (2023): 032202-032202
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Epi Source/Drain Damage Mitigation with Inner Spacer and Buffer Optimization in Stacked Nanosheet Gate-All-Around Transistors
Curtis S Durfee, Ivo Otto,Subhadeep Kal, Shanti Pancharatnam, Matthew Flaugh, Toshiki Kanaki, Matthew Rednor,Huimei Zhou,Liqiao Qin,Juntao Li,Luciana Meli,Nicolas Loubet,
Extended Abstracts of the 2023 International Conference on Solid State Devices and Materials (2023)
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Highly selective isotropic chemical dry etching for gate-all-around devices: nanosheet, forksheet and complementary FETs
Yusuke Muraki, Yusuke Oniki,Pallavi P. Gowda,Efrain Altamirano-Sánchez,Hans Mertens,Naoto Horiguchi,Frank Holsteyns,Subhadeep Kal, Cheryl Alix, Kaushik Kumar,Aelan Mosden, Trace Hurd,
Advanced Etch Technology and Process Integration for Nanopatterning XI (2022)
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Scatterometry of nanowire/nanosheet FETs for advanced technology nodes
Madhulika Korde,Subhadeep Kal, Cheryl Alix,Nick Keller,G. Andrew Antonelli,Aelan Mosden,Alain C. Diebold
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV (2021): 426-429
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Strategies For Aggressive Scaling Of Euv Multi-Patterning To Sub-20 Nm Features
Ashim Dutta,Jennifer Church, Joe Lee, Brendan O'Brien,Luciana Meli,Chi Chun Liu, Saumya Sharma,Karen Petrillo, Cody J. Murray,Eric Liu,Katie Lutker-Lee, Qiaowei Lou,
EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY XI (2020)
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Isotropic plasma free Si trim for FinFET to GAA device architectures (Conference Presentation)
Subhadeep Kal, Yusuke Oniki, Cheryl Alix,Karine Kenis,Efrain Altamirano-Sánchez,Naoto Horiguchi,Frank Holsteyns, Yusuke Muraki, Chanemougame Daniel,Aelan Mosden,Kaushik A. Kumar,Peter Biolsi,
Advanced Etch Technology for Nanopatterning IX (2020)
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