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排名必读论文期刊顶会热点AI 简史溯源树小脉星探人才迁徙塔尖人才国防情报追踪开源工具智慧手语
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论文共 10 篇作者统计合作学者相似作者

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A 2 Million Transistor Digital Signal Processor With 120 Nm Gates Fabricated By 248 Nm Wavelength Phase Shift Technology
Gp Watson,Ic Kizilyalli,M Miller, Yt Wang, B Pati,Ra Cirelli, O Nalamasu, J Radosevich, R Kohler, R Freyman, F Baumann, F Klemens,
MNE '99: Proceedings of the 25th international conference on Microelectronic engineeringno. 1-4 (2000): 101-104
引用0浏览0EI引用
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Probing The Limits Of Optical Lithography: The Fabrication Of Sub-100nm Devices With 193nm Wavelength Lithography
Ra Cirelli, J Bude, F Houlihan,A Gabor,Gp Watson,Gr Weber,Fp Klemens, J Sweeney, Wm Mansfield,O Nalamasu
MNE '99: Proceedings of the 25th international conference on Microelectronic engineeringno. 1-4 (2000): 87-90
引用1浏览0EI引用
1
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Towards The Ultimate Storage Device: The Fabrication Of An Ultra High Density Memory Device With 193nm Lithography
Ra Cirelli, J Bude, Wm Mansfield, Gl Timp,Fp Klemens,Gp Watson,Gr Weber,Jr Sweeney, F Houlihan,A Gabor, F Baumann, M Buonanno,
MICROLITHOGRAPHY 1999: ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XVI, PTS 1 AND 2 (1999): 295-304
引用3浏览0引用
3
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Revolutionary And Evolutionary Resist Design Concepts For 193 Nm Lithography
O Nalamasu, Ti Wallow,E Reichmanis,Ae Novembre,Fm Houlihan,G Dabbagh,Da Mixon,Rs Hutton, Ag Timko, Or Wood,Ra Cirelli
Microelectronic Engineeringno. 1-4 (1997): 133-136
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