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Broadband Photoresponse Enhancement by Band Engineering in Sb-doped MnBi2Te4

Zixuan Xu, Haonan Chen,Jiayu Wang,Yicheng Mou, Yingchao Xia, Jiaming Gu, Yuxiang Wang,Qi Liu, Jiaqi Liu, Wenqing Song, Qing Lan, Tuoyu Zhao,Wu Shi,Cheng Zhang

ACS PHOTONICS(2025)

Fudan Univ

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Abstract
Topological materials have attracted considerable attention for their potential in broadband and fast photoresponses, particularly in the infrared regime. However, the high carrier concentration in these systems often leads to rapid recombination of photogenerated carriers, limiting the photoresponsivity. Here, we demonstrate that Sb doping in MnBi2Te4 effectively reduces carrier concentration and suppresses electron-hole recombination, thereby significantly improving the optoelectronic performance across the visible to mid-infrared spectra. The optimally doped Mn(Bi0.82Sb0.18)2Te4 photodetector achieves a responsivity of 3.02 mA W-1 with a response time of 18.5 mu s at 1550 nm, and 0.795 mA W-1 with a response time of 9.0 mu s at 4 mu m. These values represent nearly 2 orders of magnitude improvement compared to undoped MnBi2Te4. Our results highlight band engineering as an effective strategy to enhance the infrared performance of topological material-based photodetectors, opening new avenues for high-sensitivity infrared detection.
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topological insulator,infraredphotodetectors,band engineering,vdW materials,photovoltaic effect
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要点】:论文通过在MnBi2Te4中掺杂锑(Sb)实现了能带工程,有效降低了载流子浓度并抑制了电子-空穴对的重组,从而显著提升了材料在可见光至中红外光谱范围内的光电响应性能。

方法】:研究采用掺杂策略,通过在MnBi2Te4中引入Sb原子,调整材料的能带结构,以减少载流子浓度并改善光生载流子的利用率。

实验】:实验部分通过测试优化掺杂后的Mn(Bi0.82Sb0.18)2Te4光电探测器在不同波长下的响应性,结果显示在1550 nm波长下,响应性达到3.02 mA W^-1,响应时间为18.5 μs;在4 μm波长下,响应性为0.795 mA W^-1,响应时间为9.0 μs,性能相较于未掺杂的MnBi2Te4有近两个数量级的提升。数据集名称未在文中明确提及。