High-NA EUV Single Patterning of Advanced Metal Logic Nodes: Inverse Lithography Techniques in Combination with Alternative Mask Absorbers

Ana-Maria Armeanu, Nick Pellens,Vicky Philipsen, Evgeny Malankin, Dongbo Xu, Keisuke Mizuuchi, Gabriel Curvacho,Chih-I Wei,Neal V. Lafferty,Germain L. Fenger

39th European Mask and Lithography Conference (EMLC 2024)（2024）

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