Novel Ellipsometry Metrology-Based Machine Learning Technique for Low Sensitivity Characterization of Critical Dimensions Within Gate-All-around Transistors
Metrology, Inspection, and Process Control XXXVIII（2024）
关键词
spectroscopy ellipsometry,optical critical dimension,gate all around,nanosheet,indent,machine learning
AI 理解论文
溯源树
样例
生成溯源树，研究论文发展脉络
Chat Paper
正在生成论文摘要