Preparation of Brittle Ito Microstructures Using Laser-Induced Forward Transfer Technology

The performance of transparent conductive microstructures plays a significant role in determining the device efficiency. The fabrication of ITO microstructures on the flexible optoelectronic devices remains challenging because of the high-temperature processing requirements and brittleness of the ceramic material. This paper highlights a three-dimensional microfabrication technique that combines sacrificial layer etching and laser-induced transfer. By studying the donor material thickness and the laser energy density, control of the sacrificial layer transfer thrust was achieved to yield an optimal microstructure performance. Different shapes of ITO transparent conductive microstructures were fabricated on polydimethylsiloxane (PDMS) surfaces, demonstrating structural integrity, visible light transmittances > 90 %, and resistivities of <= 8 x 10(-4) Omegacm. Finite element analysis was employed to simulate the impact transfer of the donor material onto the receiving substrate, thereby elucidating the energy-absorbing protective role of the flexible PDMS layer. Effective control of the transfer force was identified as a crucial factor in achieving the successful transfer of brittle films. This high-precision and rapid array processing approach meets the demands of automated batch manufacturing, indicating its potential for use in patterned processing on flexible substrates, as an alternative to lithographic techniques. This technique could be applied in the preparation of electronic skins and flexible devices. Additionally, for the first time, a 3 x 3 pixel resistive array sensor was integrated on a Ag nanowires/PDMS surface, demonstrating array pressure-sensing capabilities at pressures of 0-80 kPa. This study represents a significant step towards the development of multifunctional flexible optoelectronic devices.