Lithography Performance Improvement of MOR by Underlayers

Si Li, Xinlin Lu, Stephen Grannemann,Daniel Sweat,Kelsey E. Brakensiek, Pengtao Lu,Joyce A. Lowes,Vandana Krishnamurthy,Veerle Van Driessche,Douglas Guerrero

Advances in Patterning Materials and Processes XLI（2024）

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