Challenges of Photomask-Based Greyscale Lithography with a Highly Sensitive Positive Photoresist Designed for > 100 Μm Deep Greyscale Patterns
NOVEL PATTERNING TECHNOLOGIES 2024（2024）
关键词
Greyscale lithography,greyscale photomask,2.5D patterning,highly sensitive positive greyscale photoresist
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