High-power EUV light sources (>500w) for high throughput in next-generation EUV lithography tools
Klaus Hummler, Qiushi Zhu, Keegan Behm, Liane M. Matthes,Zhaohan He, Omar Biabani, Andrew LaForge, Bob Rollinger, Dustin Urone, Niek Kleemans, Martin Jurna, Sean McGrogan,Peter Mayer,Michael Purvis, Sander Derks, Alberto Villalta, Abhiram Govindaraju, Yue Ma,Daniel Brown Optical and EUV Nanolithography XXXVII（2024）
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