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Corrigendum to “study on the Affecting Factors of Material Removal Mechanism and Damage Behavior of Shear Rheological Polishing of Single Crystal Silicon Carbide” [J. Manuf. Process. 112 (2024) 5158]

Hongyu Chen, Zhengchao Wu, Binbin Hong,Wei Hang,Peng Zhang,Xingzhong Cao,Qiu Xu,Pengqi Chen,Heng Chen,Julong Yuan,Binghai Lyu,Hua-Tay Lin

JOURNAL OF MANUFACTURING PROCESSES（2024）

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Material Removal Mechanism
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