Characterization of Trap Density in Indium-Gallium-Zinc-Oxide Thin Films by Admittance Measurements in Multi-Finger MOS Structures
SOLID-STATE ELECTRONICS(2024)
Abstract
We perform trap density (Dt) extraction through admittance measurements on amorphous Indium-Gallium-Zinc-Oxide (a-IGZO) thin films using multi-finger MOS structures. We investigate the impact of channel length (Lch) on C-V and G-V characteristics and demonstrate a reliable trap density extraction method in short channel devices. The method is validated for pure and Magnesium-doped a-IGZO (Mg:IGZO). The experimental results are consistent with simulations based on a distributed network model.
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Key words
Thin-Film Transistors
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