Study of Field Distribution and Energy Density in an Indigenous DC Magnetron Sputtering Setup

Magnetron sputtering is a widely used physical deposition technique for developing both metallic and nonmetallic thin films. Researchers discovered interest in this method because of its uniform deposition, high deposition rate and low cost. This study uses the Electrostatic and Magneto-static solver program in CST Studio software to simulate the field distribution and energy distribution of a DC magnetron sputter-head that was designed and manufactured domestically. Analysis has been carried out on the field variation plot and energy density variation plot against the diameter for 3 different negative voltages: -300 V, -500 V and -800 V that were acquired from the simulation study.