Coater/developer-based Patterning Techniques to Achieve Tight Pitches with 0.33 NA Single Exposure

Kanzo Kato,Lior Huli,Nathan Antonovich,David Hetzer,Alexandra Krawicz,Na-Young Bae, Eric Liu,Akiteru Ko,Satoru Shimura,Shinichiro Kawakami, Dinh Conque,Takahiro Kitano, Seiji Nagahara,Luciana Meli,Indira Seshadri,Martin Burkhardt, Karen Petrillo,Steven Grzeskowiak

openalex（2023）

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Line Edge Roughness,Patterning Materials,Nanolithography Techniques,Nanoprobing,High-Resolution Patterning

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