Voltage ramp stress based lifetime-prediction model of advanced Al-doped HfO2 dielectric for 2.5D MIMCAPs

The reliability of an Al -doped HfO2 dielectric used in a high density 2.5D MIMCAP is investigated by constant voltage stress (CVS) and voltage ramp stress (VRS) measurements. The good agreement of the results from the two techniques allows to propose a model for lifetime prediction based on the breakdown characteristics. The extracted activation energy shows a voltage dependence associated with a change in the degradation characteristics of the high-kappa material at high fields.