谷歌浏览器插件
订阅小程序
在清言上使用

Prevention of Cu Electrolytic Migration Defects on RDL by a Cu-Selective Passivation to Enhance Reliability

Ashish S. Salunke,John Alptekin, Kaushik Akula, Subiksha Jayakumar, Shaurya Kumar,Oliver Chyan

Journal of Microelectronics and Electronic Packaging(2023)

引用 0|浏览4
暂无评分
关键词
Electrical Resistivity
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要