Atomic-scale ferroic HfO2-ZrO2 superlattice gate stack for advanced transistors
Suraj Cheema,Nirmaan Shanker,Li-Chen Wang,Cheng-Hsiang Hsu,Shang-Lin Hsu,Yu-Hung Liao,Matthew San Jose,Jorge Gomez,Wenshen Li,Jong-Ho Bae, Steve Volkman,Daewoong Kwon,Yoonsoo Rho,Gianni Pinelli,Ravi Rastogi, Dominick Pipitone,Corey Stull,Matthew Cook,Brian Tyrrell,Vladimir Stoica,Zhan Zhang,John Freeland,Christopher Tassone,Apurva Mehta, Ghazal Soheli,David Thompson,Dong Ik Suh,Won-Tae Koo,Kab-Jin Nam,Dong Jin Jung,Woo-Bin Song,Chung-Hsun Lin,Seunggeol Nam,Jinseong Heo,Costas Grigoropoulos,Padraic Shafer,Patrick Fay,Ramamoorthy Ramesh,Jim Ciston,Suman Datta,Mohamed Mohamed,Chenming Hu,Sayeef Salahuddin Research Square (Research Square)（2021）
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advanced transistors,gate,atomic-scale
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