谷歌浏览器插件
订阅小程序
在清言上使用

Large area bare Cu-Cu interconnection using micro-Cu paste at different sintering temperatures and pressures

W. Y. Li, C. T. Chen,M. Ueshima, T. Kobatake, K. Suganuma

Microelectronics reliability/Microelectronics and reliability(2023)

引用 0|浏览4
暂无评分
摘要
The microstructure evolution, shear strength, and fracture behavior of large area (10 mm x 10 mm) bare Cu-Cu interconnection sintered using micro-Cu paste at different sintering temperatures (180, 200, 250, and 300 degrees C) and assistant pressures (0, 2, 5, and 10 MPa) were investigated in this study. The results showed that, as sintering temperature and assistant pressure increased, the microstructure of the sintered joints became denser, and the bonding quality of both the Cu dummy chip/Cu paste and Cu paste/Cu substrate interfaces was elevated, while more small crack or blind hole generated at the former interface. Moreover, the shear strength of the sintered joints increased with increasing sintering temperature and assistant pressure, a robust joint could be obtained under an assistant pressure of 10 MPa regardless of the sintering temperature as well as under an assistant pressure of 5 MPa at 250 and 300 degrees C. The fracture preferred at the Cu dummy chip/Cu paste interface, and the ductility of the sintered joint increased with increasing sintering temperature and assistant pressure. Accordingly, the optimized sintering temperature and assistant pressure are 250 degrees C and 10 MPa, respectively.
更多
查看译文
关键词
Micro-Cu paste,Large-area Cu-Cu interconnection,Sintering,Shear strength
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要