Влияние Высокотемпературного Отжига На Физико-Химические Свойства Систем На Основе FeSi-=SUB=-x-=/SUB=-

It has been established that the physicochemical properties of structures based on iron silicides formed by ion implantation of iron ions into silicon depend significantly on the time of subsequent high-temperature annealing. Objects with different geometric parameters are formed on the surface and the roughness increases. Annealing at 1000 C in an Ar atmosphere is accompanied by a decrease in the content of the Fe-Si chemical bonds during the first 60 seconds. The reason for the drop in thermal conductivity with increasing annealing temperature is the formation of silicide complexes.