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Nanoscale morphology tailoring in plasma deposited CN (x) layers

Andrii Vasin, Olexander Slobodian,Andrii Rusavsky,Olexander Gudymenko, Petro Lytvyn,Stanislav Tiagulskyi,Roman Yatskiv,Jan Grym,Eugene Bortchagovsky,Volodymyr Dzhagan,Dietrich Zahn,Alexei Nazarov

JOURNAL OF PHYSICS D-APPLIED PHYSICS（2023）

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关键词
CN (x) thin layers, nanoscale morphological shaping, plasma deposition
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