An Electrical Inline-Testable Structure to Monitor Gate-Source/Drain Short Defect Caused by Imperfect Fin-Cut Patterning in FinFET Technology

Hai Zhu,Katsunori Onishi,Stephen Wu, Adam Yang, Byoung-Wook Jeong,Seong-Joon Lim, Nan Jing, Choong-Ho Lee, David Conrady,Dureseti Chidambarrao

2023 35th International Conference on Microelectronic Test Structure (ICMTS)(2023)

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Key words
MOSFET,FinFET,Defect,Inline Test,Electrical Test,Layout Design
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