The Effect of Surface Terminations on the Initial Stages of TiO2 Deposition on Functionalized Silicon.

Tyler Parke,Dhamelyz Silva-Quinones,George T. Wang,Andrew V. Teplyakov

ChemPhysChem（2023）

Cited 2|Views17
No score
Key words
atomic resists,functionalization,nucleation,silicon,TiO2 deposition
AI Read Science
Must-Reading Tree
Example
Generate MRT to find the research sequence of this paper
Chat Paper
Summary is being generated by the instructions you defined