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Exploration of alternative mask for 0.33NA extreme ultraviolet single patterning at pitch 28-nm metal design

Dongbo Xu,Werner Gillijns,Ling Ee Tan,Vicky Philipsen,Ryoung-Han Kim

JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3（2022）

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Key words
extreme ultraviolet single patterning,mask absorber,source mask optimization,logic,pitch 28 nm
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