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Radical Flux Control in Reactive Ion Beam Etching (RIBE) by Dual Exhaust System

Doo San Kim,Yun Jong Jang,Ye Eun Kim,Hong Seong Gil,Hee Ju Kim,You Jin Ji, Hyung Yong Kim,In Ho Kim, Myoung Kwan Chae, Jong Chul Park, Geun Young Yeom

Applied surface science(2022)

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关键词
reactive ion etching (RIE),reactive ion beam etching (RIBE),Radical,Ion,Exhaust,CF4,Etch profile
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