Assessing Advanced Methods in Xps and Haxpes for Determining the Thicknesses of High-K Oxide Materials: from Ultra-Thin Layers to Deeply Buried Interfaces
APPLIED SURFACE SCIENCE（2023）
关键词
Hard X-ray photoelectron spectroscopy (HAXPES),Inelastic background analysis,Angle-resolved X-ray photoelectron spectroscopy (ARXPS),High-kmaterials,Buried layers,Atomic layer deposition (ALD)
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