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A Novel Route to EUV Resists Design: Fundamental Understanding of Chemical Processes (conference Presentation)

Oleg Kostko,Bo Xu,Daniel S. Slaughter,Musahid Ahmed,D. Frank Ogletree, Kristi D. Closser,David G. Prendergast,Patrick P. Naulleau,Deirdre L. Olynick,Paul D. Ashby,Yi Liu,William D. Hinsberg,Gregory M. Wallraff

International Conference on Extreme Ultraviolet Lithography 2017（2017）

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