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OCD Enhanced: Implementation and Validation of Spectral Interferometry for Nanosheet Inner Spacer Indentation

Daniel Schmidt,Curtis Durfee,Shanti Pancharatnam,Manasa Medikonda,Andrew Greene,Julien Frougier,Aron Cepler, Gilad Belkin,Dror Shafir,Roy Koret, Roy Shtainman,Igor Turovets,Shay Wolfling

Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV（2021）

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