Effect of Peak Current Density on Inner-wall Deposition of Ti Films by High-power Impulse Magnetron Sputtering Hidetoshi KOMIYA,Yoshikazu TERANISHI,Ana B. CHAAR,Ming YANG,Tetsuhide SHIMIZUVacuum and Surface Science(2020)引用 0|浏览1暂无评分AI 理解论文溯源树样例生成溯源树,研究论文发展脉络Chat Paper正在生成论文摘要