Reaction of Implanted N Isotope with SiO2Near Si3N4-Film and SiO2-Substrate InterfaceNinad SHINDE,Noriaki MATSUNAMI,Osamu FUKUOKA,Masato TAZAWA,Tetsuo SHIMURA,Yasuhiro CHIMI,Masao SATAKAJournal of Nuclear Science and Technology(2006)引用 2|浏览0暂无评分AI 理解论文溯源树样例生成溯源树,研究论文发展脉络Chat Paper正在生成论文摘要