Detrapping Kinetics in N-polar AlGaN/GaN MIS-HEMTs
2021 IEEE 8TH WORKSHOP ON WIDE BANDGAP POWER DEVICES AND APPLICATIONS (WIPDA)(2021)
摘要
We investigated the influence of aluminum concentration in the AlGaN cap layer on the stability of threshold voltage under gate and drain stress voltages. The devices examined are N-polar GaN MIS-HEMTs with a 2.6nm layer of AlxGa1-xN cap under the gate contact. The devices have three different Al concentration (x=22%, x=34%, x=46%) in the AlGaN cap layer. DC measurements show that the devices with a higher Al concentration have a lower gate leakage current. In this work we found out: 1) the amount of threshold voltage shift during stress in these devices increases linearly with the value of gate leakage current at the different bias conditions 2) a higher Al percentage in AlGaN cap layer can suppress gate leakage current and thus reduce the instability of threshold voltage under high gate and drain filling voltages.
更多查看译文
关键词
Gallium Nitride,N-polar,Detrapping Kinetics,Threshold Voltage Transients
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要