UV-Shielding TiO₂ thin film deposition on flexible and heat-labile substrate using an open-air hybrid CVD/Plasma method

In this work, compact scratch resistant transparent amorphous TiO2 thin films are deposited at low temperature, i.e. as low as 50 degrees C, by a scalable hybrid method combining atmospheric pressure chemical vapor deposition and plasma treatment in open air. Thin film morphology, chemical composition and scratch resistance properties are investigated. The role of the plasma in the process is investigated through comparison with coatings deposited without plasma ignition. The versatile method enables film deposition on polymer film and shows good UV protection. This method, operating in open air shows promising results for the simple, large scale deposition of low carbon containing transparent TiO2 coatings at low temperature.