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Multi-Trigger Resist for Electron Beam Lithography

Carmen Popescu,Alexandra McClelland,Guy Dawson,John Roth,Dimitrios Kazazis,Yasin Ekinci,Wolfgang Theis,Alex P. G. Robinson

33RD EUROPEAN MASK AND LITHOGRAPHY CONFERENCE（2017）

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Key words
EUV lithography,molecular resist,multi-trigger resist,chemical amplification,resist sensitivity
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