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Process Context Based Wafer Level Grouping Control: an Advanced Overlay Process Correction Designed for DRAM 1z Nm Node in High Volume Manufacturing

Linmiao Zhang, William Susanto, Katsumasa Takahashi,Albert Chen, Tim Tang, Yi Zou,Chenxi Lin,Simon Hastings,Samee Ur Rehman,Manouk Rijpstra, Alfonso Sun

METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXXIV（2020）

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关键词
Overlay,Advanced process correction,Wafer level control
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