谷歌浏览器插件
订阅小程序
在清言上使用

Diminishing the Induced Strain and Oxygen Incorporation on Aluminium Nitride Films Deposited Using Pulsed Atomic-Layer Epitaxy Techniques at Standard Pressure MOCVD

Journal of electronic materials(2021)

引用 4|浏览3
暂无评分
关键词
Aluminium nitride,pulsed atomic-layer epitaxy,induced strain,luminescence defect,oxygen impurities,MOCVD
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要