Silicon Dioxide Deposited Using Atmospheric Pressure Plasma Chemical Vapor Deposition for Improved Adhesion and Water Intrusion Resistance for Lightweight Manufacturing

Zachary Jeckell,Dhruval Patel,Andrew Herschberg, Tag Choi,David Barlaz,Lucia Bonova,Ivan Shchelkanov,Brian Jurczyk,David Ruzic

Surfaces and interfaces（2021）

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关键词
Atmospheric pressure plasma,chemical vapor deposition,silicon oxide,lap shear strength,barrier coating
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