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Defect detection strategies and process partitioning for SE EUV patterning

Luciana Meli,Karen Petrillo,Anuja De Silva,John Arnold,Nelson Felix,Chris Robinson,Benjamin Briggs,Shravan Matham,Yann Mignot,Jeffrey Shearer,Bassem Hamieh,Koichi Hontake,Lior Huli,Corey Lemley,Dave Hetzer,Eric Liu,Ko Akiteru,Shinichiro Kawakami,Takeshi Shimoaoki,Yusaku Hashimoto,Hiroshi Ichinomiya,Akiko Kai,Koichiro Tanaka,Ankit Jain,Heungsoo Choi,Barry Saville,Chet Lenox

Proceedings of SPIE（2018）

引用 6|浏览20
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关键词
Stochastic defects,Single-Expose EUV patterning,inspection techniques,CDU,LCDU
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