Spatial Control of the Self-assembled Block Copolymer Domain Orientation and Alignment on Photopatterned Surfaces

Ji Yeon Kim,Philip Liu,Michael J. Maher,Devon H. Callan,Christopher M. Bates,Matthew C. Carlson,Yusuke Asano,Gregory Blachut,Charles T. Rettner,Joy Y. Cheng,Daniel F. Sunday,R. Joseph Kline,Daniel P. Sanders,Nathaniel A. Lynd,Christopher J. Ellison,C. Grant Willson,Carlos R. Baiz

ACS applied materials & interfaces（2020）

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photopatterning,block copolymers,directed self-assembly,lithography,photoacid diffusion,thin films,infrared spectroscopy,NEXAFS spectroscopy

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