Effect of process conditions on properties of an OER- CVD SiO 2 film at room temperatureTakayuki Hagiwara,Naoto Kameda, Toshinori Miura,Yoshiki Morikawa,Mitsuru Kekura, Ryoji Kosugi,Ken Nakamura,Hidehiko NonakaThe Japan Society of Applied Physics(2019)引用 23|浏览10暂无评分AI 理解论文溯源树样例生成溯源树,研究论文发展脉络Chat Paper正在生成论文摘要