Chrome Extension
WeChat Mini Program
Use on ChatGLM
VIPCreated with Sketch.

Use of Si KLL Auger Shifts and the Auger Parameter in XPS to Distinguish Ti Silicides from a Ti/Si Mixture in Thin Films

Ghazal Saheli, Takashi Kuratomi, I-Cheng Chen,Paul Mack,Christopher Lazik,Jeffrey Anthis,David M. Thompson, Christopher R. Brundle

Journal of electron spectroscopy and related phenomena（2019）

Cited 1|Views8
No score
Key words
XPS,Non-destructive depth profiling,SiKLL,Auger parameter,Ti silicide,Thin films,Chemical composition
AI Read Science
Must-Reading Tree
Example
Generate MRT to find the research sequence of this paper
Chat Paper
Summary is being generated by the instructions you defined