Analysis on corrosion resistant of electrodeposited ternary Co-W-P alloy

Abstract The interest in the electrodeposition of tungsten-rich binary and ternary alloys has increased in recent years due to their unique combination of electrical, tribological, electro-erosion and magnetic properties. A novel ternary alloy of Cobalt-Tungsten-Phosphorus (Co-W-P) for electroplating and operational parameters were proposed and optimised to give the best corrosion resistance. The development of a stable bath with relatively low pH levels and the use of complexing agents to stabilise it is critical to obtaining good quality films to increase its lifetime. The surface methodology and response were used as optimisation tools. The baths used for achieving this league without complexing agents were unstable. Analysis of the microstructure of the composite particle evaluates the 3D surface luminance structure and the profile structure of the electrodepositions of corrosion resistant of Co-W-P Alloy. Transverse-sectional views of the specimens were extracted and analysed, and the surface roughness, waviness profile, and Gaussian filter of the structures Co-W-P alloy were observed. Good quality Co-W-P alloy films were obtained using an electrochemical bath with the complexing agent. The coatings showed good adhesion on gloss. The characterisation of alloy morphology was performed using spectrometer fluorescence, Power Spectrum Density (PSD) and scanning electron microscopy (SEM). The excellent operating conditions for obtaining this film were a current density of 6 mA/cm 2 and pH 4.0.