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Nanofabrication by Field-Emission Scanning Probe Lithography and Cryogenic Plasma Etching

Claudia Lenk,Martin Hofmann,Steve Lenk,Marcus Kaestner,Tzvetan Ivanov,Yana Krivoshapkina, Diana Nechepurenko,Burkhard Volland,Mathias Holz,Ahmad,Alexander Reum,Chen Wang,Mervyn Jones,Zahid Durrani,Ivo W. Rangelow

Microelectronic Engineering（2018）

引用 12|浏览77
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关键词
Single electron transistor,Room temperature,Field-emission scanning probe lithography,Cryogenic reactive ion etching
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