In Situ Growth of Al 2 O 3 as a Passivation and Antireflection Layer on TiO 2 -Based MSM Photodetectors

The in situ growth of Al2O3 on TiO2 by ultrasonic spray pyrolysis deposition is presented in this paper. Here, Al2O3 is used as the passivation and the antireflection layer. TiO2-based photodetectors (PDs) with Al2O3, SiO2, and no passivation layers were studied. It was found that the PD without the passivation layer has the highest dark current and photocurrent due to high internal photoconductiv...