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Integrated Approach to Improving Local CD Uniformity in EUV Patterning

Andrew Liang,Jan Hermans, Timothy Tran,Katja Viatkina,Chen-Wei Liang,Brandon Ward, Steven Chuang,Jengyi Yu,Greg Harm,Jelle Vandereyken,David Rio,Michael Kubis,Samantha Tan,Rich Wise,Mircea Dusa,Sirish Reddy, Akhil Singhal,Bart van Schravendijk,Girish Dixit,Nader Shamma

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE（2017）

Cited 10|Views21
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Key words
EUV,co-optimization,synergy,etch,lithography,LCDU,LCDU improvement,deposition
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