Cost Effective Solution Using Inverse Lithography Opc For Dram Random Contact Layer

Jinhyuck Jun,Jaehee Hwang,Jaeseung Choi,Seyoung Oh,Chanha Park,Hyunjo Yang,Thuc Dam,Munhoe Do,Dongchan Lee,Guangming Xiao,Jung-Hoe Choi,Kevin Lucas

DESIGN-PROCESS-TECHNOLOGY CO-OPTIMIZATION FOR MANUFACTURABILITY XI（2017）

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Key words
ILT, Inverse Lithography, OPC, Single patterning technology
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