Root Cause Analysis of Overlay Metrology Excursions with Scatterometry Overlay Technology (SCOL)

Karsten Gutjahr,Dongsuk Park,Yue Zhou,Winston Cho, Ki Cheol Ahn,Patrick Snow, Richard McGowan,Tal Marciano,Vidya Ramanathan,Pedro Herrera,Tal Itzkovich,Janay Camp,Michael Adel

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE（2016）

引用 3|浏览6
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关键词
SCOL,Diffraction based overlay,Root Cause Analysis,overlay,target design,accuracy,litho metrology
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