Diffusion Study of 15 N Implanted into Α-Ti Using the Nuclear Resonance Technique

The diffusion of 15N in α-Ti was studied in the 673–1023 K temperature range by using the ion implantation and nuclear resonance techniques. The measurements show that the diffusion coefficients follow an Arrhenius behavior D(T)=D0 -Q/RT, where D0=(1.1±0.8)×10-7 m2 s-1 and Q=(183±2) kJ/mol. A comparison with previous results is also given.