Synthesis of Buried Layers of Β-Sic in Si by Multiple Energy Carbon Ion Implantations and Post Thermal Annealing

A systematic study has been performed to synthesize buried homogeneous layers of β-SiC by multiple energies (15–65keV) of carbon ion implantations into Si(100), followed by high temperature thermal annealing. A continuous stoichiometric SiC layer of 170nm thickness has been formed in the implanted region when the sample was annealed at 1100°C for 1h. The formation of a β-SiC thin film has been confirmed by using X-ray diffraction, Fourier transform infrared spectroscopy, X-ray photoelectron spectroscopy, and transmission electron microscopy techniques.